| Acronym | Meaning |
 | PCPI | Permanent Committee On Patent Information |
| HEC | Human Equivalent Concentration |
| MAK | Maximale Arbeitplatz Konzentration; Maximum Allowed Concentration At Workplace |
| JPO | Japanese Patent Office |
| LPA | Local Plasma Approxn. (in Calcns. Of Stopping Powers For Ions By Films) |
| AUMP | Annihilated Unrestricted Moeller-Plesset (spin Contaminant) |
| RESS | Rapid Expansion Of Supercritical Solution |
| ICL | Interface Control Layer |
| WTQA | Waste Testing And Quality Assurance |
| MPLS | Modified Partial Least Squares |
Browse by Letter:
